Register Now: ANSI ISO Forum (AIF) and U.S. ISO Secretariat Workshop Scheduled for February 17-18 at Georgia Tech

Registration Deadline Is February 1

The American National Standards Institute (ANSI) will hold a meeting of the ANSI ISO Forum (AIF) on February 17, 2016, at the Georgia Institute of Technology facilities in Atlanta. In conjunction with this event, ANSI will host a Secretariat Workshop on best management practices for U.S.-held Secretaries of International Organization for Standardization (ISO) Committees and their support staff on February 18 at the same location.

Key discussion topics during the Wednesday ANSI AIF meeting will include:

• Transparency, communication, and document retention in the ISO standards development process and ISO social media guidelines

• Proposed new changes to the ISO directives

• ISO IT tools and services

• ISO/International Electrotechnical Commission (IEC) project management workshop for chairs, secretaries, and convenors.

• ISOT report

The following day's ANSI Secretariat Workshop for U.S. secretaries of ISO committees and support staff is intended to provide practical information on day-to-day issues facing Secretariats via highly interactive discussions on common issues and best practices. Sophie Clivio, ISO technical policy manager and Technical Management Board (TMB) secretary, will be among the presenters sharing their expertise and leading panels and break-out sessions.

Key discussion topics during the workshop will include:

• Effective project management for the ISO secretary

• Managing difficult situations

• Maximizing ISO's IT tools

• Fostering relationships

An AIF meeting information packet, including information on local accommodations, and a Secretariat Workshop schedule are available for interested parties.

Registration for both events ends on February 1, 2016. To register, please email Kristen Califra at [email protected] indicating which meeting(s) you wish to attend. Contact Ms. Califra for more information or questions regarding the event.