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ANSI Co-Organizes Workshop in China on Electrostatic Discharge Standardization


New York, Dec 17, 2012

The American National Standards Institute (ANSI), together with the Electrostatic Discharge Association (ESDA) and the China National Institute for Standardization (CNIS), organized a symposium focused on the key information technology priority issue of electrostatic discharge on November 11-12, 2012. The event was supported by the ANSI Manufacturer Member Roundtable, and included U.S. speakers from ESDA as well as Chinese experts from the Beijing Oriental Institute of Measurement, among others.

The symposium, which attracted over 150 attendees, focused on identifying areas of priority for the U.S. and China, and potential for cooperation. A sometimes overlooked aspect of information technology products, electrostatic discharge (ESD) – which is triggered by static electricity – can have serious impacts on the life cycle of computers, mobile phones, and other devices, leading to significant time and financial costs.

As a major center for manufacturing, China sees the importance of the development of ESD standards, along with the implementation of ESD-safe manufacturing processes. The country’s involvement in the development and implementation of these standards will improve the relevance and widespread adoption of international standards such as those developed by ESDA. Experts at the symposium successfully identified concrete next steps for cooperation, and both sides indicated a strong interest in continuing the collaboration in the future.

The three speakers attending this event from the ESDA were Nate Peachey, John Kinnear, and Terry Welsher. Mr. Peachey is the ESDA Standards business unit manager; Mr. Kinnear is the chairperson for facility certification for ESDA; and Mr. Welsher is the ESDA’s senior vice president. After the workshop, Mr. Kinnear stated, “In order for our standards to be widely adopted in China and for our business to be sustainable, it is critical that we identify the right organizations and individuals for engagement. The workshop in Beijing was a great success and we have a strong foundation of cooperation to build on with CNIS. Without ANSI’s facilitation and involvement, it would have been impossible for our organization to achieve this level of meaningful exchange.”

More information on the symposium is available from the event website here. In addition, interested parties may contact Elise Owen, ANSI director of international development, at intl@ansi.org.

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